content, increase steam quality, work with H2 more
In recent years, ULSI device production technology has advanced in
two major directions: miniaturization and increase in wafer diameter.
However, the demand for device reliability continues to increase.
In 1995, Fujikin succeeded in developing a new water vapor generating
system that generates ultra-high purity water vapor by means of a
catalytic reaction of O2 and H2 a a radically different
means than conventional pyrogenic water vapor generators.
Since then we have continued to gather data, perform exhaustive durability
tests, and continually improved upon our process to create the present
Water Vapor Generator (WVG).
The WVG catalytic reaction allows water vapor to be generated at a
much lower temperature than is possible with conventional pyrogenic
systems, and provides both high levels of safety and contamination-free
Now with an expanded range of flow control, the WVG may be used in
a wide variety of processes.